RIE Reactive Ion Etcher CCP Dry Etching Equipment Suitable for photoresist residue removal and media etching
MOQ
1 unités
Délai de livraison
N/A jours
Stock disponible
20 unités
Origine
CN
Marque / Fournisseur
Shenzhen Naen Technology Co., Ltd.
Caractéristiques du produit
| Unit | set |
| Trade Term | EXW |
| Markup Rate | 0.03 |
| Incoterm Note | EXW 出厂价(非 FOB).美元价 = 人民币出厂价 × 1.03 ÷ 6.7. |
| Price Cny Exw | 23.69 |
| Fx Rate Usd Cny | 6.7 |
| Price Cny Original | 23 |
Landed Cost
$3.79
Duty
$0.00
VAT
$0.18
Est. Shipping
$0.07
Shenzhen Naen Technology Co., Ltd.
Integrity
Fulfillment
100.00
Type
factory
Description du produit
RIE Reactive Ion Etcher CCP Dry Etching Equipment Suitable for photoresist residue removal and media etching. Specifications: Brand: Naen Technology. Wholesale & OEM/ODM supported. Price varies by order quantity.
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